Books
1 results found| Title | Authors | Description | OpenBook ID | |
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Advances in CMP/polishing technologies for the manufacture of electronic devices | Ioan D. Marinescu,Toshiro K. Doi,Syuhei Kurokawa | CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. --P. 4 of cover. | OL16565398W |